OF MOS TECHNOLOGIES
April 20-22, 2020
The technologies required to enable large spectroscopic surveys are one of the most challenging in astronomical instrumentation: instruments need to be accurate, with micrometer positioning accuracy and repeatability; fast, to minimize overheads; robust, to minimize failure; and low cost.
In recent years, new mechatronic devices have been developed to place thousands of high-throughput optical fibres at any given position on the focal plane. Other technologies subject to current R&D involve micro-mirror and micro-shutter arrays, programmable slit masks and, with increasing importance, photonics technologies (e.g., multi-core fibres, photonic lanterns, multiplexers, arrayed waveguide gratings).
This event will provide an excellent opportunity to bring together experts from different areas and groups with the goal to:
Present current and future MOS instruments and facilities.
Discuss and share innovative ideas for the design and development of new MOS instrumentation.
Identify the key enabling technologies that will require active industrial development.
Recognise new techniques and manufacturing capabilities in the market.
Examine optimal target acquisition and positioning methods and algorithms.
Review unbiased estimators to account for MOS assignment strategies.
The workshop will comprise invited and contributed talks. Invited review talks will help set the scene, and will include more technical presentations on MOS systems for facilities currently under construction and development.
We welcome contributions on, e.g., novel ideas, designs, developments, and results from currently built MOS facilities—including talks on ‘lessons learned’ from technology groups and science users.
Industrial partners are encouraged to present their technical and manufacturing capabilities, as a key element in the development of future MOS instrumentation.
Registration & Coffee
Afternoon Session A
Morning Session A
Afternoon Session B
January 13: First announcement
March 15: Abstract submission deadline
April 1: Closing of registration (or when maximum capacity is reached)
April 20-22: Workshop
Registration & Participants
Attendance is limited to 80 participants
CSIC Office, Rue du Trône 62